A sturdy reliable profilometer used for measuring film thickness, step height, and surface morphology located inside our Class 100 cleanroom.

• Operating instructions (PDF)
• Manual (PDF)

Hg Lamp with long UV wavelengths ideal for curing epoxy or applications requiring prolonged UV exposure. Protective UV shield and glasses available and required while in the immediate vicinity of the station.

Mask aligner used for transferring patterns using either standard UV or Deep UV wavelengths from masks onto substrates. Backside IR alignment capability. Substrates up to 150mm in diameter can be easily accommodated.

• Operating instructions (PDF)
• ABM Mask Aligner Manuals
  • Model 150 Digital Intensity Meter Manual
  • Light Source Manual
  • Intensity-Controlling Power Supply
  • Mask Alignment and Exposure System Manual

Used for aligning masks on wafers with photo-resist. Used for 2 and 3 inch wafers.

• UA MFC Partial Mask Catalog
• MJB3 Service Manual
• Operating Instructions

Used for non-critical image transfer and blanket exposure.

• Operating instructions (PDF)

A reliable platform used in spin coating primers, photoresists, and polymer coatings located in the lithography area of our Class 100 cleanroom.

• Operating Instructions (PDF)
• Lithography Information
  • AZ 3300 Series Datasheet
  • AZ 3312 Data Package
  • AZ P4000 Series Datasheet
  • AZ P4620 Data Package
  • Microchem Su-8 Datasheet
  • Shipley 1800 Series Datasheet
  • Microposit SC 1827 Spin Curve
  • MCC Primer 80/20

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Located in our Cleanroom this system is capable of plasma etching and plasma cleaning substrates as large as 300mm (12") in diameter. It can etch silicon nitride, silicon dioxide, polysilicon, germanium and polymers. It can clean and remove photoresists and organic residues. 

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• Operating Instructions
• AGS RIE Manuals
  • AGS Plasma System 900 Manual
  • Alcatel ACP-15G Dry Pump
  • AT-6 Automatic Matching Network
  • ENI 600W Backup RF Generator
  • Oerlikon TW250S Turbo Pump
  • Dressler Cesar 136 600W Supply
  • Bay Voltex Tempryte Chiller
  • MC2 Matching Network Controller
  • Pfeiffer Hi Pace 300C Turbo Brochure
  • Proteus Industries Flow Switch

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This furnace is used for annealing metallized substrates or samples where surface chemical contamination is not an issue. This tube can handle substrates less than 4" in diameter.