The Tempress Low Pressure Chemical Vapor Deposition (LPCVD) system is a modular horizontal furnace designed to process substrates up to 150mm in diameter as part of the semiconductor, optical, MEMS, and solar device manufacturing. It is a 4-stack system set up to deposit silicon nitride, polysilicon, low temperature oxide (LTO), silicon rich oxide (SRO), phosphorus doped LTO, and phosphorus doped polysilicon. All tubes operate independently.

• Nitride Process Checklist
• Quartz Tube Installation Procedure
• Nitride Furnace Consumable Inventory
• Operating Instructions
• Manuals (links to page full of PDFs at mfc.arizona.edu - this will need to be moved)

Located in our Class 100 cleanroom, this system allows for the thermal deposition of metals including Cu, Al, AlSi, In, etc. Deposition occurs under high vacuum. In its current configuration, this system is more suitable for deposition of thin films of more than a hundred nanometers or so.

• Operating instructions (PDF)
• Manual (PDF)

Located in our Class 100 cleanroom, our BOC Edwards Auto 306 is an electron beam evaporation system used for deposition of ultra pure films of metals as well as fused silica. Fully reproducible parameters provide consistent, repeatable deposition results. The most common metals deposited using this system at MFC are Au, Cu, Ti, Cr. System can deposit up to four different materials in series in the same run. This system is most suitable for thin films of a few nanometers to a few microns.

• Operating Instructions
• Ebeam Process Log (Blank)

Electron Beam Manuals

• RV3, RV5, RV8, and RV12 Rotary Vane Pumps Instruction Manual, Issue P (A652-01-880)
• XDS Replacement Tip Seal Kit Instruction Manual, Issue C (A726-01-840)
• XDS Dry Pump Instruction Manual, Issue H (A726-01-880)
• PVEK Valves Instruction Manual, Issue G (C411-02-885)
• Pirani Vacuum Gauges (For use with 500, 1000, 1700, 2000, and 4000) Instruction Manual, Issue D (D021-57-880)
• Penning Vacuum Gauge Heads CP25EK (D145-35-880)
• Auto 306 Accessories: Water Cooled Crystal Holder, Crystal and Oscillator Unit Instruction Manual, Issue A (E086-67-880)
• Auto 306 Vacuum Coater, Volume 2, Instruction Manual, Issue E (E090-02-860)
• Auto 306 Accessories: Rotary Workholder Volume 1 - Installation and Maintenance Instructions, Issue B (E090-49-880, Vol 1)
• Auto 306 Accessories: Rotary Workholder Volume 2 - Operating Instructions, Issue B (E090-49-880, Vol 2)
• Auto 306 Accessories: EB3 Multihearth Electron Beam Source Accessories, Issue A (E090-72-840)
• Auto 306 Accessories: Workholder and Heater Accessories, Volume 1 - Instruction and Maintenance Instructions, Issue F (E090-26-880)
• Auto 306 Accessories: Manual Source Shutter and Electromagnetic Source Shutter, Volume 1 - Instructions and Maintenance Instructions, Issue G (E090-32-880)
• Auto 306 Accessories: EB3 Multihearth Electron Beam Source and Accessories, Volume 1 - Instruction and Maintenance Instructions, Issue F (E090-72-880)
• XT555H Instruction Manual, Issue A (NRA-266-880)
• FTM7 Film Thickness Monitor, Instruction Manual, Issue B (E086-69-880)
• Auto 306 Vacuum Coater with Turbo Molecular Pumping System, Issue G (E090-03-860)
• Seiko STP 301/451 Turbomolecular Pump Series (MT21E003F)
• Neslab Coolflow II Heat Exchanger (Neslab System II)

The Verteq Spin Rinse Dryer (SRD) handles 200mm substrates. Wafers are cleaned using DI water and dried with Nitrogen in a static free environment.

• Operating instructions (PDF)

Located in our Class 100 cleanroom's lithography area, our double-stacked Semitool SRD will winse wafers to the required resistivity using ultra-pure water and dry wafers using hot UHP N2. The system is currently set up to handle both 100mm and 150mm wafers.

• Operating instructions (PDF)

The BOC Edwards Eco-Snow TM cleaning system uses carbon dioxide to clean substrates and surfaces using a specially designed Eco-Snow TM variable orifice jet spray gun. The use of carbon dioxide mitigates the need for the use of toxic and expensive solvents in many cleaning applications. This system is equipped with a nitrogen purged mini-environment (with blower), an electrostatic discharge control system, substrate holder which can be heated, IR lamp, and various nozzle for the CO2 jet spray gun.

• Operating Instructions (PDF)
• Clean Dry Box Manual CB100 (PDF)
• Jet Spray Gun Manual (PDF)