The Tempress Low Pressure Chemical Vapor Deposition (LPCVD) system is a modular horizontal furnace designed to process substrates up to 150mm in diameter as part of the semiconductor, optical, MEMS, and solar device manufacturing. It is a 4-stack system set up to deposit silicon nitride, polysilicon, low temperature oxide (LTO), silicon rich oxide (SRO), phosphorus doped LTO, and phosphorus doped polysilicon. All tubes operate independently.
- Nitride Process Checklist
- Quartz Tube Installation Procedure
- Nitride Furnace Consumable Inventory
- Operating Instructions
- Manuals (links to page full of PDFs at mfc.arizona.edu - this will need to be moved)
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